Method for forming source/drain contacts

ABSTRACT

A semiconductor structure includes a substrate, a semiconductor fin connected to the substrate, an epitaxial layer disposed over the semiconductor fin, and a silicide feature over and in contact with the epitaxial layer. The epitaxial layer including silicon germanium (SiGe) and further includes gallium (Ga) in an upper portion of the epitaxial layer that is in contact with the silicide feature.

This is a continuation application of U.S. patent application Ser. No.15/904,502, filed Feb. 26, 2018, which claims the benefit of U.S.Provisional Application No. 62/592,032, entitled “Method for FormingSource/Drain Contacts,” filed Nov. 29, 2017, herein incorporated byreference in its entirety.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experiencedexponential growth. Technological advances in IC materials and designhave produced generations of ICs where each generation has smaller andmore complex circuits than the previous generation. In the course of ICevolution, functional density (i.e., the number of interconnecteddevices per chip area) has generally increased while geometry size(i.e., the smallest component (or line) that can be created using afabrication process) has decreased. This scaling down process generallyprovides benefits by increasing production efficiency and loweringassociated costs. Such scaling down has also increased the complexity ofprocessing and manufacturing ICs and, for these advancements to berealized, similar developments in IC processing and manufacturing areneeded.

For example, when the scaling down continues beyond 32 nm or smaller,source/drain (S/D) contact resistance becomes more and more dominant inoverall transistor resistance. Methods and structures for reducing S/Dcontact resistance are highly desired.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isemphasized that, in accordance with the standard practice in theindustry, various features are not drawn to scale. In fact, thedimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIG. 1A shows a flow chart of a method of forming a semiconductor deviceaccording to embodiments of the present disclosure.

FIG. 1B shows a perspective view of a semiconductor device, in portion,in a manufacturing stage according to the method in FIG. 1A inaccordance with embodiments of the present disclosure.

FIGS. 2A, 3A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, and 11A are cross-sectionalviews (along a fin length direction) of a portion of a semiconductordevice during various manufacturing stages according to the method inFIG. 1A in accordance with embodiments of the present disclosure.

FIGS. 2B, 3B, 4B, 5B, 6B, 7B, 8B, 9B, 10B, and 11B are cross-sectionalviews (along a fin width direction) of a portion of a semiconductordevice during various manufacturing stages according to the method inFIG. 1A in accordance with embodiments of the present disclosure.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly. Still further, when anumber or a range of numbers is described with “about,” “approximate,”and the like, the term is intended to encompass numbers that are withina reasonable range including the number described, such as within +/−10%of the number described or other values as understood by person skilledin the art. For example, the term “about 5 nm” encompasses the dimensionrange from 4.5 nm to 5.5 nm.

The present disclosure is generally related to semiconductor devices andmethods of forming the same. More particularly, the present disclosureis related to forming source/drain (S/D) contacts for p-typetransistors, particularly for p-type FinFETs. One object of the presentdisclosure is to reduce S/D contact resistance by implanting gallium(Ga) into S/D features having silicon germanium (SiGe) followed byappropriate annealing processes including annealing at a SiGerecrystallization (or repair) temperature. Embodiments of the presentdisclosure select certain ratio between Si and Ge in the S/D features toimprove the Ga atoms' solubility therein, and select certain annealingtemperatures and duration to allow both (a) SiGe alloy to repair afterGa ion implantation, and (b) Ga ions or atoms to segregate at the top ofthe S/D features. Both (a) and (b) help reduce S/D contact resistance.For example, the segregated Ga ions or atoms at the top of the S/Dfeatures reduce the formation of stable compounds having metal, silicon,and boron, thereby reducing the resistance between S/D contact plugs andthe Ga-implanted SiGe S/D features. For example, recrystallizationincreases the conductivity in the SiGe alloy. These and other aspects ofthe present disclosure will be further discussed with reference to FIGS.1A-11B.

FIG. 1A shows a flow chart of a method 10 of forming a semiconductordevice 100, according to various aspects of the present disclosure. Aperspective view of the semiconductor device 100 at a fabrication stageis illustrated in FIG. 1B. The method 10 is merely an example, and isnot intended to limit the present disclosure beyond what is explicitlyrecited in the claims. Additional operations can be provided before,during, and after the method 10, and some operations described can bereplaced, eliminated, or relocated for additional embodiments of themethod. Method 10 is described below in conjunction with FIGS. 2A-11Bwhich are cross-sectional views of the semiconductor device 100 invarious stages of a manufacturing process. Particularly, FIGS. 2A, 3A,4A, 5A, 6A, 7A, 8A, 9A, 10A, and 11A are cross-sectional views of aportion of the device 100 along a fin length direction “A-A” of FIG. 1B;and FIGS. 2B, 3B, 4B, 5B, 6B, 7B, 8B, 9B, 10B, and 11B arecross-sectional views of the portion of the device 100 along a fin widthdirection “B-B” of FIG. 1B. The semiconductor device 100 is provided forillustration purposes and does not necessarily limit the embodiments ofthe present disclosure to any number of devices, any number of regions,or any configuration of structures or regions. Furthermore, thesemiconductor device 100 as shown in FIGS. 2A-11B may be an intermediatedevice fabricated during processing of an IC, or a portion thereof, thatmay comprise static random access memory (SRAM) and/or logic circuits,passive components such as resistors, capacitors, and inductors, andactive components such as p-type field effect transistors (PFETs),n-type FETs (NFETs), multi-gate FETs such as FinFETs, metal-oxidesemiconductor field effect transistors (MOSFETs), complementarymetal-oxide semiconductor (CMOS) transistors, bipolar transistors, highvoltage transistors, high frequency transistors, other memory cells, andcombinations thereof.

At operation 12, the method 10 (FIG. 1A) provides a structure of thedevice 100 as shown in FIGS. 2A and 2B, with FIG. 1B showing theperspective view of some of the components of the device 100. Referringto FIGS. 1B, 2A, and 2B collectively, the device 100 includes asubstrate 102 and various features formed therein or thereon. The device100 further includes one or more semiconductor fins 103 (one shown)separated by an isolation structure 105. Particularly, FIG. 2Aillustrates the device 100 in a cross-sectional view along the length ofthe fin 103 (the “x” direction), and FIG. 2B illustrates the device 100in a cross-sectional view along the width of the fin 103 (the “y”direction) in an S/D region of the device 100. The device 100 furtherincludes gate stacks (or gate structures) 106 adjacent to channelregions of the fin 103 and S/D features 104 over the fin 103 and on bothsides of the gate stacks 106. The device 100 further includes gatespacers 108 on sidewalls of the gate stacks 106, fin sidewall spacers107 on sidewalls of the fins 103, a contact etch stop layer (CESL) 110over the gate spacers 108 and the S/D features 104, and a dielectriclayer 112 over the CESL 110 and filling in the gaps between adjacentgate spacers 108. The various features (or components) of the device 100are further described below.

The substrate 102 is a silicon (Si) substrate in the present embodiment.In alternative embodiments, the substrate 102 includes other elementarysemiconductors such as germanium (Ge); a compound semiconductor such assilicon carbide (SiC), gallium arsenide (GaAs), indium arsenide (InAs),and indium phosphide (InP); or an alloy semiconductor, such as silicongermanium carbide (SiGeC), gallium arsenic phosphide (GaAsP), andgallium indium phosphide (GaInP). In embodiments, the substrate 102 mayinclude silicon on insulator (SOI) substrate, be strained and/orstressed for performance enhancement, include epitaxial regions, dopedregions, and/or include other suitable features and layers.

The fins 103 may include one or more layers of semiconductor materialssuch as silicon or silicon germanium. In an embodiment, the fins 103include multiple layers of semiconductor materials alternately stackedone over the other, for example, having multiple layers of silicon andmultiple layers of silicon germanium alternately stacked. The fins 103may be patterned by any suitable method. For example, the fins 103 maybe patterned using one or more photolithography processes, includingdouble-patterning or multi-patterning processes. Generally,double-patterning or multi-patterning processes combine photolithographyand self-aligned processes, allowing patterns to be created that have,for example, pitches smaller than what is otherwise obtainable using asingle, direct photolithography process. For example, in one embodiment,a sacrificial layer is formed over a substrate and patterned using aphotolithography process. Spacers are formed alongside the patternedsacrificial layer using a self-aligned process. The sacrificial layer isthen removed, and the remaining spacers, or mandrels, may then be usedas a masking element for patterning the fins 103. For example, themasking element may be used for etching recesses into semiconductorlayers over or in the substrate 102, leaving the fins 103 on thesubstrate 102. The etching process may include dry etching, wet etching,reactive ion etching (RIE), and/or other suitable processes. Forexample, a dry etching process may implement an oxygen-containing gas, afluorine-containing gas (e.g., CF₄, SF₆, CH₂F₂, CHF₃, and/or C₂F₆), achlorine-containing gas (e.g., Cl₂, CHCl₃, CCl₄, and/or BCl₃), abromine-containing gas (e.g., HBr and/or CHBR₃), an iodine-containinggas, other suitable gases and/or plasmas, and/or combinations thereof.For example, a wet etching process may comprise etching in dilutedhydrofluoric acid (DHF); potassium hydroxide (KOH) solution; ammonia; asolution containing hydrofluoric acid (HF), nitric acid (HNO₃), and/oracetic acid (CH₃COOH); or other suitable wet etchant. Numerous otherembodiments of methods to form the fins 103 may be suitable.

The S/D features 104 may include epitaxial semiconductor materials, forexample, for applying proper stress and enhancing performance of thedevice 100. In the present embodiment, the S/D features 104 includeepitaxially grown silicon germanium (SiGe) alloy, which may be dopedwith one or more p-type dopants such as boron (B) or indium (In). In anembodiment, the ratio between Ge and Si in the SiGe alloy is greaterthan 1 (i.e., Ge:Si>1). In a further embodiment, an atomic concentrationof Ge in the SiGe alloy is greater than 50% but less than 90%, such asin a range from about 55% to about 75%. In other words, the S/D features104 include Si_(1-x)Ge_(x) alloy where x represents Ge composition inatomic percent and x is greater than 50% and less 90%, such as in arange from about 55% to about 75%. In various embodiments, the specificrange of Ge concentration in the S/D features 104 is selected to fulfillmultiple purposes. One purpose is to improve gallium's solubility in theSiGe alloy during a subsequent gallium ion implantation process. It hasbeen found that the higher the Ge:Si ratio in the SiGe alloy, the easierfor gallium ions or atoms to dissolve in the SiGe alloy, hence the lessdefects in the SiGe alloy after it has been implanted with gallium ions.However, the Ge:Si ratio in the SiGe alloy also affects the activationof the p-type dopants (e.g., boron) therein. It has been found that thehigher the Ge:Si ratio, the lower the activation rates of the p-typedopants. In the present embodiment, the selection of the Ge:Si ratio (asdiscussed above) favors the gallium dissolvability in order to reducethe S/D contact resistance while ensuring sufficient activation rates ofthe p-type dopants for device performance. Still further, the selectionof the Ge:Si ratio in the SiGe alloy works in conjunction withsubsequent annealing processes (e.g., operation 18) to foster SiGerecrystallization and to reduce defects therein.

In one implementation, the S/D features 104 are formed by etchingrecesses into the fins 103 and epitaxially growing SiGe alloy doped withone or more p-type dopants such as boron and/or indium. The doping maybe performed during the epitaxial growth (in-situ) or after theepitaxial growth (ex-situ). Further, each of the S/D features 104 mayinclude one or more layers (e.g., three layers) of SiGe alloy withdifferent dopant concentrations. Adjacent S/D features 104 may beseparated from each other or may merge together in some embodiments.Each of the S/D features 104 may be of any suitable shape such as amulti-facet shape.

The isolation structure 105 may include silicon oxide (SiO₂), siliconnitride (Si₃N₄), silicon oxynitride (SiON), fluoride-doped silicateglass (FSG), a low-k dielectric material, and/or other suitableinsulating material. In an embodiment, the isolation structure 105 isformed by etching trenches in or over the substrate 102 (e.g., as partof the process of forming the fins 103), filling the trenches with aninsulating material, and performing a chemical mechanical planarization(CMP) process and/or an etching back process to the insulating material,leaving the remaining insulating material as the isolation structure105. Other types of isolation structure may also be suitable, such asfield oxide and LOCal Oxidation of Silicon (LOCOS). The isolationstructure 105 may include a multi-layer structure, for example, havingone or more liner layers on surfaces of the substrate 102 and the fins103 and a main isolating layer over the one or more liner layers.

Each of the gate stacks 106 includes a multi-layer structure. Forexample, each of the gate stacks 106 may include a dielectricinterfacial layer (not shown), a gate dielectric layer 106A (e.g., SiO₂)over the dielectric interfacial layer, and a gate electrode layer 106Bover the gate dielectric layer 106A. In an embodiment, each of the gatestacks 106 includes a so-called “high-k metal gate” that may include ahigh-k gate dielectric layer 106A, a work function layer (a part of thegate electrode layer 106B) over the high-k gate dielectric layer, and ametal layer (another part of the gate electrode layer 106B) over thework function layer. The gate stacks 106 may include additional layerssuch as capping layers and barrier layers. In various embodiments, thedielectric interfacial layer may include a dielectric material such assilicon oxide (SiO₂) or silicon oxynitride (SiON), and may be formed bychemical oxidation, thermal oxidation, atomic layer deposition (ALD),chemical vapor deposition (CVD), and/or other suitable methods. Thehigh-k gate dielectric layer may include hafnium oxide (HfO₂), zirconiumoxide (ZrO₂), lanthanum oxide (La₂O₃), titanium oxide (TiO₂), yttriumoxide (Y₂O₃), strontium titanate (SrTiO₃), other suitable metal-oxides,or combinations thereof; and may be formed by ALD and/or other suitablemethods. The work function layer may include a metal selected from butnot restricted to the group of titanium aluminum nitride (TiAlN),titanium nitride (TiN), tantalum nitride (TaN), ruthenium (Ru),molybdenum (Mo), tungsten (W), platinum (Pt), aluminum (Al), orcombinations thereof; and may be deposited by CVD, PVD, and/or othersuitable process. The gate electrode layer may include polysilicon or ametal such as aluminum (Al), tungsten (W), cobalt (Co), copper (Cu),and/or other suitable materials; and may be deposited using plating,CVD, PVD, or other suitable processes. The gate stacks 106 may be formedby any suitable processes including gate-first processes and gate-lastprocesses. In a gate-first process, various material layers aredeposited and patterned to become the gate stacks 106 before the S/Dfeatures 104 are formed. In a gate-last process (also termed as a gatereplacement process), temporary gate structures are formed first. Then,after the S/D features 104 are formed, the temporary gate structures areremoved and replaced with the gate stacks 106.

Each of the fin sidewall spacers 107 and the gate spacers 108 may be asingle layer or multi-layer structure. In some embodiments, each of thespacers 107 and 108 include a dielectric material, such as silicon oxide(SiO₂), silicon nitride (Si₃N₄), silicon oxynitride (SiON), otherdielectric material, or combination thereof. In an example, the spacers107 and 108 are formed by depositing a first dielectric layer (e.g., aSiO₂ layer having a substantially uniform thickness) as an liner layerover the device 100 including the gate stacks 106 and the fins 103, anda second dielectric layer (e.g., a Si₃N₄ layer) as a main D-shapedspacer over the first dielectric layer, and then, anisotropicallyetching to remove portions of the dielectric layers to form the spacers107 and 108. Additionally, the fin sidewall spacers 107 may be partiallyremoved during the etching process that forms recesses into the fins 103prior to growing the S/D features 104. In some embodiments, the finsidewall spacers 107 may be completely removed by such etching process.

The CESL 110 may include silicon nitride (Si₃N₄), silicon oxynitride(SiON), silicon nitride with oxygen (O) or carbon (C) elements, and/orother materials. In one example, the CESL 110 includes silicon nitride(Si₃N₄) having an intrinsic stress with a magnitude of 1 GPa or higher.The intrinsic stress is compressive for p-channel devices and tensilefor n-channel devices. The CESL 110 may be formed by plasma enhanced CVD(PECVD) process and/or other suitable deposition or oxidation processes.The CESL 110 covers the outer surfaces of the S/D features 104, thesidewalls of the gate spacers 108, and the top surface of the isolationstructure 105.

The dielectric layer (or interlayer dielectric or ILD) 112 may includematerials such as tetraethylorthosilicate (TEOS) oxide, un-dopedsilicate glass, or doped silicon oxide such as borophosphosilicate glass(BPSG), fluoride-doped silicate glass (FSG), phosphosilicate glass(PSG), boron doped silicon glass (BSG), and/or other suitable dielectricmaterials. The dielectric layer 112 may be deposited by a PECVD process,a flowable CVD (FCVD) process, or other suitable deposition technique.In an embodiment, the CESL 110 is deposited as a conformal layer overthe substrate 102 covering various structures thereon, and thedielectric layer 112 is deposited over the CESL 110 to fill trenchesbetween the gate stacks 106.

At operation 14, the method 10 (FIG. 1A) etches the dielectric layer 112and the CESL 110 to expose the S/D features 104, in preparation forforming S/D contacts over the respective S/D features 104. This mayinvolve a variety of processes including deposition, photolithography,and etching.

Referring to FIGS. 3A and 3B, an etch mask 114 is formed over the device100, providing openings 116 exposing various portions of the device 100.The openings 116 correspond to the areas of the device 100 where S/Dcontacts for S/D features 104 are to be formed. In various embodiments,the etch mask 114 may include a hard mask layer (e.g., having siliconnitride or silicon oxide), a photoresist layer, or a combinationthereof. The etch mask 114 may be formed by photolithography and etchingprocesses.

Referring to FIGS. 4A and 4B, the device 100 is etched through theopenings 116 to remove the exposed portions of the dielectric layer 112,for example, using a dry etching process, a wet etching process, areactive ion etching process, or other suitable etching processes. Inthe present embodiment, the etching process is tuned selective to thematerial of the dielectric layer 112, and does not (or insignificantly)etch the gate stacks 106, the gate spacers 108, and the CESL 110.

Referring to FIGS. 5A and 5B, the device 100 is etched through theopenings 116 to remove portions of the CESL 110 at the bottom of theopenings 116, for example, using a dry etching process, a wet etchingprocess, or a reactive ion etching process. Particularly, this etchingprocess is anisotropic and is tuned selective to the CESL 110. As aresult, portions of the CESL 110 remain over the sidewalls of the gatestacks 106 after the etching process is finished. In variousembodiments, the dielectric layer 112 and the CESL 110 may be etched byone joint etching process or more than one etching process.

At operation 16, the method 10 (FIG. 1A) implants gallium (Ga) ions orGa and boron (B) ions into the exposed S/D features 104. In anembodiment, the operation 16 implants only Ga ions into the exposed S/Dfeatures 104. However, certain B ions may be in-situ doped into the S/Dfeatures 104 when the S/D features 104 are epitaxially grown. Therefore,both Ga ions and B ions may still be co-existent in the S/D features 104in such embodiment. In another embodiment, the operation 16 implantsboth Ga ions and B ions into the exposed S/D features 104. In thisembodiment, implanting B ions increases the B contents in the S/Dfeatures 104. As shown in FIGS. 6A and 6B, the operation 16 produces aGa-implanted layer 124 in a top portion of the S/D feature 104. In anembodiment, the device 100 includes both p-type devices and n-typedevices. To further this embodiment, the method 10 forms a maskingelement (not shown) covering the n-type devices and exposing the p-typedevices for the operation 16.

In some embodiments, the depth D1 of the Ga-implanted layer 124 alongthe Z direction is in a range from about 5 nm to about 15 nm. The Gaions may be distributed evenly or unevenly (e.g., having a gradientdistribution in its ion density) within the Ga-implanted layer 124. Ifthe depth D1 is too large (e.g., exceeding 20 nm), the defectsintroduced by the Ga implantation might not be fully repaired by theannealing processes (e.g., operation 18) to be discussed. To furtherthese embodiments, the Ga ion implantation at operation 16 may beperformed with energy ranging from about 0.5 keV to about 10 keV.Typically, smaller implantation energy produces a smaller depth D1. Insome implementations, the Ga ion implantation at operation 16 isperformed with a Ga ion dose ranging from about 5E14 ions/cm² (orsimply, cm⁻²) to about 8E15 cm⁻², such as from about 5E14 cm⁻² to about1E15 cm⁻². The selected range of Ga ion dose is beneficial in variousembodiments. If the ion dose is too low, the effects of Ga implantation(for reducing S/D contact resistance) may be negligible. If the ion doseis too high, the implanted Ga ions may not be completely dissolved intothe SiGe alloy in the S/D features 104, increasing defects therein.

In embodiments where boron (B) ions are also implanted at the operation16, B ion implantation can be performed together with the Ga ionimplantation or be performed separately. For example, B ion implantationcan be performed first at a doping energy between about 0.5 keV to about10 keV with an ion dose ranging from about 1E15 cm⁻² to about 1E16 cm⁻²such as from about 1E15 cm⁻² to about 2E15 cm⁻², followed by the Ga ionimplantation as discussed above. In some implementations, the order ofthe B ion implantation and the Ga ion implantation can be reversed, withGa ion implantation performed first. In some other embodiments, the Gaion implantation and the B ion implantation are performedsimultaneously. For example, at the operation 16, the S/D features 104can be implanted at a doping energy between about 0.5 keV and about 10keV with boron ions at a dose between about 1E15 cm⁻² and about 2E15cm⁻² and gallium ions at a dose between about 5E14 cm⁻² and about 1E15cm⁻².

At operation 18, the method 10 (FIG. 1A) performs a first annealingprocess to the device 100. In the present embodiment, the firstannealing process is designed to re-crystallize the SiGe alloy in theS/D features 104, which may have been amorphized (becoming moreamorphous) during the operation 16. In the present disclosure, the term“SiGe recrystallization” and alike refer to the process where the SiGealloy repairs itself (e.g., during a thermal process) to become lessamorphous by removing vacancies, amorphous layers, and/or crystallineimperfections resulted from the gallium/boron ion implantation. The lessamorphous the SiGe alloy, the better conductivity it may provide. In thepresent embodiment, the first annealing process is performed at atemperature in a range from about 400 degrees Celsius (° C.) to about600° C., such as from about 525° C. to about 575° C., and for durationin a range from about 10 seconds to about 50 seconds, such as from about20 seconds to about 40 seconds. In a specific example, the firstannealing process may be performed at about 550° C. for about 30seconds. In various embodiments, the annealing duration may be shorterwhen the annealing temperature is higher, and the annealing duration maybe longer when the annealing temperature is lower. The annealingtemperature and duration are chosen to benefit various aspects of thepresent disclosure, as discussed below.

One aspect is related to the integrity of the gate stacks 106. Since thegate stacks 106 may include one or more metals in the presentembodiment, the first annealing process is performed at a sufficientlylow temperature so as not to damage the gate stacks 106. For example,the first annealing process is performed at a temperature below themelting point of the metal materials in the gate stacks 106. Anotheraspect is related to the SiGe recrystallization in the S/D features 104.If the annealing temperature is too low, the SiGe alloy may not be ableto repair the defects introduced by the Ga ion implantation, or theannealing process may take too long to be economically practical for thesemiconductor manufacturing. Therefore, the temperature for the firstannealing process is controlled to be in the ranges discussed above. Thefirst annealing process also serves another purpose—it causes Ga atomsor ions to segregate and move to a top portion of the S/D features 104.Ga and silicon generally form eutectic bonds. These bonds are easilybroken at the temperature of the first annealing process. Once the bondsare broken, the Ga atoms or ions tend to move to a top portion of theS/D features 104. As a result, the Ga-implanted layer 124 becomesthinner after the operation 18. FIGS. 7A and 7B illustrate thesemiconductor device 100 after the first annealing process. The depth D2within the S/D features 104 where Ga is distributed is smaller than D1,for example by 40% to 60%. For example, in an embodiment where D1 isabout 15 nm, D2 may range from about 6 nm to about 8 nm. As will bediscussed later, the segregated Ga atoms or ions help reduce S/D contactresistance.

The operation 18 may also clean surfaces of the S/D features 104 toprepare them for a subsequent silicidation process. For example, theoperation 18 may use a dry cleaning process or a wet cleaning process.For example, a dry cleaning process may use SiConi etch, which is aremote plasma assisted dry etch process involving the simultaneousexposure of an object to H₂, NF₃, and NH₃ plasma by-products. Forexample, a wet cleaning process may involve the use of dilutedhydrofluoric acid (DHF) solution to clean the surfaces of the S/Dfeatures 104.

At operation 20, the method 10 (FIG. 1A) deposits a layer 126 into theopening 116, as part of a silicidation process. Referring to FIGS. 8Aand 8B, the layer 126 is deposited to be in physical contact with theS/D feature 104 including SiGe alloy and Ga atoms. In an embodiment, thelayer 126 includes a conductive material having one or more metals. Forexample, the layer 126 may include titanium (Ti). Additionally oralternatively, the layer 126 may include tantalum (Ta), nickel (Ni),platinum (Pt), ytterbium (Yb), iridium (Ir), erbium (Er), cobalt (Co),or a combination thereof (e.g., an alloy of two or more metals). Thelayer 126 may be deposited using CVD, PVD, ALD, or other suitablemethods. In an embodiment, the etch mask 114 may be removed before thedeposition of the layer 126.

At operation 22, the method 10 (FIG. 1A) performs a second annealingprocess to the device 100 to cause reaction between the layer 126 andthe S/D feature 104, thereby producing a silicide feature 128 (FIGS. 9Aand 9B). In an embodiment, the second annealing process is performed ata temperature in a range from about 400° C. to about 600° C., such asfrom about 525° C. to about 575° C., and for duration in a range fromabout 5 seconds to about 30 seconds, such as from about 10 seconds toabout 20 seconds. In a specific example, the second annealing processmay be performed at about 550° C. for about 15 seconds. In variousembodiments, the second annealing duration may be shorter when thesecond annealing temperature is higher, and the second annealingduration may be longer when the second annealing temperature is lower.The temperature of the second annealing process is chosen to maintainthe integrity of the gate stacks 106 as discussed above with respect tothe operation 18, yet high enough to cause reaction between the metallicmaterials in the layer 126 and the semiconductor materials in the S/Dfeature 104. In an embodiment, the second annealing process causes theGa ions to further segregate and to move up in the S/D features 104. Asa result, the depth of the Ga-implanted layer 124 may become eventhinner. In other words, the depth D3 (FIG. 9A) is smaller than thedepth D2 (FIG. 7A) in this embodiment.

In the present embodiment, the silicide feature 128 includes one or morecompounds having Si and one or more metals from the layer 126, and mayfurther include Ge and/or Ga. For example, the silicide feature 128 mayinclude titanium silicide (TiSi), nickel silicide (NiSi),nickel-platinum silicide (NiPtSi), nickel-platinum-germanium silicide(NiPtGeSi), nickel-germanium silicide (NiGeSi), ytterbium silicide(YbSi), platinum silicide (PtSi), iridium silicide (IrSi), erbiumsilicide (ErSi), cobalt silicide (CoSi), or other suitable compounds.Depending on the type of the metals in the layer 126, the silicidefeature 128 may or may not include a stable compound of the metal(s) andGa. For example, when the layer 126 includes Ti, the feature 128 mayinclude a stable compound of Ti—Si, and Ga atoms may be segregated at aninterface between the S/D feature 104 (including the Ga-implanted layer124) and the silicide feature 128. This provides benefits to the presentdisclosure because the segregated Ga atoms help reduce resistance byblocking boron atoms from reacting with the silicide feature 128. Theboron atoms may be introduced into the S/D feature 104 during theepitaxial growth of the S/D feature 104 or during the Ga and B ionimplantation (the operation 16). Without the segregated Ga atoms, theboron atoms would react with Ti or TiSi to form stable compounds Ti—B₂or Ti—Si—B, which have a relatively high sheet resistance.

At operation 24, the method 10 (FIG. 1A) remove un-reacted portions ofthe layer 126, leaving the silicide feature 128 exposed in the opening116 (FIGS. 10A and 10B). The operation 24 may include a wet etchingprocess, a dry etching process, a reactive ion etching process, or othersuitable etching processes. The etching processes in operation 24 areselective to the materials in the layer 126.

At operation 26, the method 10 (FIG. 1A) performs a third annealingprocess to activate dopants (e.g., Ga or Ga and B) in the S/D features104. In the present embodiment, the third annealing process is performedat a temperature higher than that of the first (operation 18) and thesecond (operation 22) annealing processes. In a further embodiment, thetemperature of the third annealing process is designed to maintain theintegrity of the gate stacks 106. For example, it is performed at atemperature below a melting point of the metals in the gate stacks 106.In an embodiment, the third annealing process is performed at atemperature in a range from about 700° C. to about 950° C., such as fromabout 800° C. to about 900° C., for duration ranging from about 10seconds to about 20 seconds, and using mostly spike annealing. Theoperation 26 may use one or more annealing processes such as microwaveannealing (MWA) process, microsecond annealing (OSA) process, rapidthermal annealing (RTA) process, dynamic spike annealing (DSA) process,melting laser annealing (MLA) process, and/or other suitable annealingprocesses.

At operation 28, the method 10 (FIG. 1A) forms an S/D contact plug (orsimply, S/D contact) 130 over the silicide feature 128 by depositing oneor more metals or metallic compounds (e.g., TiN) in the opening 116.Referring to FIGS. 11A and 11B, the S/D contact 130 is deposited overthe top and side surfaces of the S/D features 104 in the presentembodiment. Particularly, the S/D contact 130 is in direct contact withthe silicide feature 128, which interfaces with the S/D feature 104having SiGe alloy. The Ga-implanted layer 124 (having segregated Gaatoms) is disposed between the silicide feature 128 and the SiGe alloy.In an embodiment, there are some Ga contents in the silicide feature 128too. However, the Ga concentration in the silicide feature 128 is muchlower than that in the Ga-implanted layer 124. For example, the Gaconcentration in the silicide feature 128 may be only about 5% to about20% of that in the Ga-implanted layer 124. The total resistance in theS/D path (including the S/D contact 130, the silicide feature 128, theGa-implanted layer 124, and the SiGe alloy in the S/D feature 104) isadvantageously reduced by various aspects of the present disclosureincluding Ga ion implantation (the operation 16), the first annealingprocess (the operation 18), and the silicidation process (the operations20-24).

In embodiments, the S/D contact 130 may include tungsten (W), cobalt(Co), copper (Cu), other metals, metal nitrides such as titanium nitride(TiN), titanium aluminum nitride (TiAlN), tungsten nitride (WN),tantalum nitride (TaN), or combinations thereof, and may be formed byCVD, PVD, plating, and/or other suitable processes. In an embodiment,the etch mask 114 is removed before the deposition of the metallicmaterial(s) for the S/D contact 130. Further, a CMP process may beperformed to planarize a top surface of the device 100, remove excessiveportions of the metallic material(s), and remove the etch mask 114 (ifit has not been removed). The resulting structure is shown in FIGS. 11Aand 11B.

The method 10 may perform further steps to complete the fabrication ofthe device 100. For example, it may perform various processes to formS/D contacts for n-type transistors, form gate contacts electricallycoupled to the gate stacks 106, and form metal interconnects connectingthe FinFETs as well as other portions of the device 100 to form acomplete IC. Further, although the embodiments shown in FIGS. 2A-11Binclude fins 103 (therefore applicable to FinFETs), the presentdisclosure is not so limited, and the disclosed techniques can beapplied to planar transistors or other types of multi-gate transistorsfor reducing S/D contact resistance in those transistors.

Although not intended to be limiting, one or more embodiments of thepresent disclosure provide many benefits to a semiconductor device and aformation process thereof. For example, embodiments of the presentdisclosure reduce source/drain (S/D) contact resistance by implantinggallium (Ga) ions into S/D features having silicon germanium (SiGe)alloy followed by a low-temperature annealing process. The Ge atomicconcentration in the SiGe alloy is designed to increase Ga's solubilityin the SiGe alloy and to reduce ion implantation defects therein. Thelow-temperature annealing process also removes defects in the SiGealloy. Further, the provided subject matter can be readily integratedinto existing IC fabrication flow and can be applied to many differentprocess nodes.

In one exemplary aspect, the present disclosure is directed to a method.The method includes providing a structure that includes a substrate; agate structure over the substrate; and a source/drain (S/D) featureincluding silicon germanium (SiGe) adjacent to the gate structure. Themethod further includes implanting gallium (Ga) into the S/D feature;performing a first annealing process at a first temperature torecrystallize the SiGe; depositing a conductive material including ametal over the S/D feature after the first annealing process; performinga second annealing process at a second temperature to cause reactionbetween the metal and the S/D feature; and performing a third annealingprocess at a third temperature to activate dopants including Ga in theS/D feature.

In an embodiment of the method, the third temperature is higher than thefirst and second temperatures. In another embodiment, the firsttemperature is in a range from about 400 degrees Celsius to about 600degrees Celsius. In yet another embodiment, both the first and thesecond temperatures are in a range from about 400 degrees Celsius toabout 600 degrees Celsius.

In some embodiment of the method, a ratio of Ge:Si in the SiGe isgreater than 1. In an embodiment, Ge concentration in the SiGe rangesfrom about 55% to about 75%. In some embodiment, the implanting of Gaapplies a Ga ion dose ranging from about 5E14 cm⁻² to about 1E15 cm⁻².

In an embodiment, the method further includes implanting boron (B) intothe S/D feature simultaneously with the implanting of Ga. In anotherembodiment, after the second annealing process and before the thirdannealing process, the method further includes removing unreactedportions of the conductive material. In a further embodiment, after thethird annealing process, the method further includes depositing anotherconductive material over the S/D feature.

In an embodiment, the metal includes titanium. In some embodiments, thegate structure includes a high-k dielectric layer and a metal gateelectrode.

In another exemplary aspect, the present disclosure is directed to amethod. The method includes providing a structure that includes asubstrate; a gate structure over the substrate; a source/drain (S/D)feature including silicon germanium (SiGe) adjacent to the gatestructure; and one or more dielectric layers over sidewalls of the gatestructure and over the S/D feature. The method further includes etchingthe one or more dielectric layers to form an opening exposing the S/Dfeature; implanting gallium (Ga) ions into the S/D feature through theopening; and performing a first annealing process at a recrystallizationtemperature of the SiGe. The method further includes depositing amaterial including a metal over the S/D feature after the firstannealing process; performing a second annealing process to form acompound having Si and the metal over the S/D feature; performing athird annealing process to activate dopants including Ga in the S/Dfeature; and forming an S/D contact plug over the compound.

In an embodiment of the method, the recrystallization temperature of theSiGe is in a range from about 525 degrees Celsius to about 575 degreesCelsius. In some embodiments, Ge concentration in the SiGe ranges fromabout 55% to about 75%. In some embodiments, the first annealing processcauses Ga ions to segregate and to move to a top portion of the S/Dfeature. In some embodiments, the first and second annealing processesare performed at about a same temperature that is lower than atemperature of the third annealing process.

In yet another exemplary aspect, the present disclosure is directed to amethod. The method includes providing a structure that includes asubstrate; a high-k metal gate structure over the substrate; and asource/drain (S/D) feature including silicon germanium (SiGe) adjacentto the high-k metal gate structure. The method further includesimplanting gallium (Ga) ions and boron (B) ions into the S/D feature andperforming a first annealing process at a recrystallization temperatureof the SiGe. The method further includes depositing a conductivematerial including a metal over the S/D feature after the firstannealing process; performing a second annealing process to form one ormore compounds having Si and the metal over the S/D feature; performinga third annealing process to activate dopants including Ga and B in theS/D feature; and forming an S/D contact plug over the one or morecompounds.

In an embodiment of the method, Ge concentration in the SiGe ranges fromabout 55% to about 75%. In an embodiment, the third annealing process isperformed at a temperature higher than the recrystallizationtemperature.

The foregoing outlines features of several embodiments so that those ofordinary skill in the art may better understand the aspects of thepresent disclosure. Those of ordinary skill in the art should appreciatethat they may readily use the present disclosure as a basis fordesigning or modifying other processes and structures for carrying outthe same purposes and/or achieving the same advantages of theembodiments introduced herein. Those of ordinary skill in the art shouldalso realize that such equivalent constructions do not depart from thespirit and scope of the present disclosure, and that they may makevarious changes, substitutions, and alterations herein without departingfrom the spirit and scope of the present disclosure.

What is claimed is:
 1. A method, comprising: providing a structure thatincludes: a substrate; a semiconductor fin; and an epitaxial featureover the semiconductor fin, the epitaxial feature including silicongermanium (SiGe); doping gallium (Ga) into the epitaxial feature;performing a first annealing process at a first temperature; depositinga conductive material including a metal over the epitaxial feature afterthe first annealing process; and performing a second annealing processat a second temperature to cause reaction between the metal and theepitaxial feature.
 2. The method of claim 1, wherein the firsttemperature is in a range from about 400 degrees Celsius to about 600degrees Celsius.
 3. The method of claim 1, wherein both the first andthe second temperatures are in a range from about 400 degrees Celsius toabout 600 degrees Celsius.
 4. The method of claim 1, further comprising:performing a third annealing process at a third temperature higher thanthe first and second temperatures.
 5. The method of claim 4, after thesecond annealing process and before the third annealing process, furthercomprising: removing unreacted portions of the conductive material. 6.The method of claim 1, further comprising: doping boron (B) into theepitaxial feature simultaneously with the doping of gallium.
 7. Themethod of claim 1, wherein Ge concentration in the SiGe ranges fromabout 55% to about 75%.
 8. The method of claim 1, wherein the metalincludes titanium.
 9. A method comprising: providing a structure thatincludes: a substrate; a gate structure over the substrate; and anepitaxial feature including silicon germanium (SiGe) adjacent to thegate structure; doping gallium (Ga) ions into the epitaxial feature;performing a first annealing process at a recrystallization temperatureof the SiGe; depositing a material including a metal over the epitaxialfeature after the first annealing process; performing a second annealingprocess to form a compound having at least Si and the metal over theepitaxial feature; and performing a third annealing process to activatedopants including Ga in the epitaxial feature.
 10. The method of claim9, further comprising: forming a conductive plug over the compound afterthe performing of the third annealing process.
 11. The method of claim9, wherein both the first and the second annealing processes areperformed at temperatures ranging from about 400 degrees Celsius toabout 600 degrees Celsius.
 12. The method of claim 11, wherein Geconcentration in the SiGe ranges from about 55% to about 75%.
 13. Themethod of claim 9, further comprising: doping boron (B) into theepitaxial feature before the performing of the first annealing process.14. A method for making a semiconductor structure, comprising: providinga substrate, a semiconductor fin connected to the substrate, and anepitaxial layer disposed over the semiconductor fin; implanting gallium(Ga) in an upper portion of the epitaxial layer; and forming a silicidefeature over and in contact with the epitaxial layer, wherein theepitaxial layer including silicon germanium (SiGe) and is in contactwith the implanted upper portion.
 15. The method of claim 14, whereinthe Ga is implanted in the upper portion of the epitaxial layer to athickness of about 6 nm to 8 nm.
 16. The method of claim 14, wherein aratio of germanium to silicon (Ge:Si) in the SiGe is greater than
 1. 17.The method of claim 14, wherein germanium (Ge) concentration in the SiGeranges from about 55% to about 75%.
 18. The method of claim 14, whereinthe upper portion of the epitaxial layer further includes boron.
 19. Themethod of claim 14, wherein the silicide feature includes Ge or Ga. 20.The method of claim 14, wherein the silicide feature includes titaniumsilicide and is substantially free of gallium and boron.